Ultra High Purity Filters

Product Details

• Product Name:Ultra High Purity Filters
• Materialof the Valve body: 316L，316L VAR
• Inlet Size:1/4”,1/2”
• End Connection: Integral Male VCR Metal Gasket Face Seal Fitting

 

Features

• Excellent chemical compatibility
• 100% helium leak tested
• Particle removal rating of ≥ 0.003 µm, with a filter efficiency greater than 99.9999999% at maximum flow rate

Application:

1. Core Application Area: Semiconductor and Microelectronics Manufacturing

This is the primary and most stringent application scenario for such filters, used to protect key process equipment and ensure chip yield.

Chemical Vapor Deposition (CVD): Filters precursor gases for deposition reactions (e.g., silane, ammonia, metal organics) to prevent particle contamination of thin films.

Physical Vapor Deposition (PVD): Filters process gases such as argon in sputtering and other processes.

Dry Etching: Filters etching gases (e.g., carbon tetrafluoride, sulfur hexafluoride, chlorine) to ensure etching precision.

Ion Implantation: Filters doping gases.

Photolithography: Protects the internal gas environment of lithography machines.

Chip Packaging: Provides ultra-high purity protective atmosphere in advanced packaging processes.

 

1. Flat Panel Display (FPD) Manufacturing

Used in film deposition, etching, and other processes during the production of OLED, LCD, and other display panels to filter process gases and prevent defects.

 

III. Photovoltaic Industry (Solar Cells)

Used in CVD and other processes during the production of high-efficiency crystalline silicon or thin-film solar cells to filter gas impurities and improve cell conversion efficiency.

 

1. Light-Emitting Diode (LED) Manufacturing

Filters ultra-high purity ammonia, hydrogen, metal organic source gases, etc., in core epitaxial growth equipment like MOCVD to ensure the luminous performance and consistency of LED chips.

 

1. Optical Fiber Preform Manufacturing

Filters high-purity gases (e.g., silicon tetrachloride, germanium tetrachloride, oxygen) used in vapor deposition processes for producing the core and cladding layers of optical fibers.

 

1. Scientific Research and Laboratories

 

Analytical Instruments: Provides ultra-high purity carrier or protective gas filtration for precision analytical equipment such as Mass Spectrometers (MS), Gas Chromatographs (GC), and Atomic Absorption Spectrometers (AAS).

 

Materials Science Laboratories: Filters reaction gases in experimental equipment for preparing nanomaterials, superconducting materials, or other advanced functional materials.

 

Life Sciences: Used in cutting-edge biological laboratories requiring high-purity gases for cell culture, gene sequencing, etc.

 

VII. Other High-End Industrial Fields

 

Special Metal Processing: Provides ultra-high purity inert protective gas (e.g., argon) filtration during the melting or heat treatment of reactive metals like titanium and zirconium.

 

Aerospace: Used in manufacturing or testing stages with extreme requirements for gas cleanliness.